Photopatterning
AssigneeConductive Inkjet Technology Limited
InventorsPhilip Gareth Bentley, David Stephen Thomas
Life of this patent
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Abstract
A photopatternable structure (10) comprises an optically transparent substrate (12) having first and second faces (14, 16), coated respectively with first and second photosensitive materials (18, 20), the coated substrate being opaque to electromagnetic radiation of one or more wavelengths to which the photosensitive materials are sensitive. In use, the faces (14, 16) are exposed (sequentially or simultaneously) to curing radiation to which the photosensitive materials are sensitive and to which the coated substrate is opaque, resulting in two sided photopatterning without through -cure occurring.
Claims23
A photopatternable structure, comprising an optically transparent substrate having first and second faces, a coating of a first photosensitive material of the substrate on the first face and a coating of a second photosensitive material on the second face of the substrate, the coated substrate being opaque to electromagnetic radiation of one or more wavelengths to which the first and second photosensitive materials are sensitive.
Dependencies are inferred from the claim text.