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US 2013/0340497 A1Published application
Method to adjust gas concentration in fluids and device thereof
AssigneeMurthy Tata
InventorMurthy Tata
Life of this patent
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Abstract
A method to adjust gas concentration in a fluid and a device thereof is provided. The method comprises configuring a container of a second volume (VC) to receive a first volume (VL) of the fluid into the container. The second volume (VC) of the container is determined based on an initial concentration (Ci) of the first gas in the fluid, a target concentration (Cf) of the first gas in the fluid, a partition coefficient (φ) of the first gas, and the first volume (VL) of the fluid for obtaining the target concentration (Cf).
Claims22
A method to adjust gas concentration in a fluid comprising:
- configuring a container of a second volume (VC) to receive a first volume (VL) of the fluid into the container, wherein the second volume (VC) of the container is determined based on an initial concentration (Ci) of a first gas in the fluid, a target concentration (Cf) of the first gas in the fluid, a partition coefficient (φ) of the first gas, and the first volume (VL) of the fluid for obtaining the target concentration (Cf).
A device to adjust gas concentration in a fluid comprising:
- a container, the container comprises a first opening, the first opening is configured to receive a first volume (VL) of a fluid in the container, wherein the fluid has an initial concentration (Ci) of a first gas and wherein a second volume (VC) of the container is determined based on the initial concentration (Ci) of the first gas in the fluid, a target concentration (Cf) of the first gas in the fluid, a partition coefficient (φ) of the first gas, and the first volume (VL).
Dependencies are inferred from the claim text.