Aperture control of thermal preocessing radiation
AssigneeApplied Materials, Inc.
InventorsAmikam Sade, Stephen Moffatt, Bruce E. Adams
Life of this patent
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Abstract
Device for processing a substrate are described herein. Devices can include a radiation source and an aperture positioned to receive radiant energy from the radiation source. The aperture can include one or more members, and one or more interfering areas, wherein the interfering areas surround a transmissive area. The one or more structures can affect transmission of radiant energy through a portion of the transmissive area of the aperture. Structures disposed on the aperture can reduce or redirect transmission to provide for more uniform overall transmission of radiant energy through the aperture.
Claims20
A device for processing a substrate comprising:
- a thermal annealing radiation source;
- an aperture positioned to receive radiant energy from the thermal annealing radiation source, the aperture comprising:
- at least one transmissive member;
- and
- an energy blocking member, wherein the energy blocking member comprises an interfering area, and wherein the interfering area defines a transmissive area through the transmissive members;
- and
- at least one structure affecting transmission of radiant energy through a portion of the transmissive area of the aperture.
A device for processing a substrate comprising:
- a thermal annealing radiation source which provides radiant energy;
- an aperture positioned to receive radiant energy from the thermal annealing radiation source, the aperture comprising:
- at least one transmissive member;
- one or more first structures comprising an interfering area formed on or in the transmissive member;
- and
- a transmissive area, wherein the transmissive area is defined by the first structures;
- and
- one or more second structures disposed in at least a portion of the transmissive area of the aperture.
Dependencies are inferred from the claim text.