System and method for sealing a vapor deposition source

A method for coating a substrate, the method comprising:

• situating the substrate in a deposition chamber of a system, the system comprising:
• the deposition chamber;
• a vapor pocket located within the deposition chamber;
• a source block to provide an amount of heat to generate a vapor for the vapor pocket;
• and
• at least one movable seal thermally connected to the source block and configured to form a first seal with a first portion of the substrate and to prevent the vapor from leaking past the first portion of the substrate out of the vapor pocket, wherein the at least one movable seal comprises:
• a first flange forming a wall of the vapor pocket;
• a second flange configured to be movably disposed within a first groove of the source block
• positioning the substrate proximate to the vapor pocket and forming a gap between the vapor pocket and the first portion of the substrate;
• and
• movably sealing the gap.