Method for increasing the robustness of a double patterning router used to manufacture integrated circuit devices

A method for fabricating an integrated circuit device using

• a double patterning router, comprising:
• providing a set of original color rules defining an original color rule space;
• providing a set of integrated circuit designs defining a design space;
• perturbing said original color rules to define a perturbed color rule space;
• processing, using said double patterning router, said perturbed color rule space and said design space to expose double pattern routing odd cycle decomposition errors;
• feeding back said decomposition errors to said router;
• reconfiguring said router to correct said decomposition errors;
• generating a design layout which does not include said odd cycle decomposition errors;
• and
• manufacturing an integrated circuit device based on said design layout.

A double patterning router for use in manufacturing integrated circuit devices, comprising a data input module, a display module, and a processor module, wherein:

• said data input module is configured to receive data representing a design space and data representing an original color space;
• said processor module is configured to perturb said original color rules to produce a perturbed color rule space and to process said design space and said perturbed color rule space and to expose odd cycle decomposition errors resulting therefrom;
• and
• said display module is configured to illustrate said decomposition errors.