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US 2013/0295776 A1Published application
Method for vapor condensation and recovery
AssigneeMSP Corporation
InventorsBenjamin Y.H. Liu, Thuc M. Dinh, Yamin Ma
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Abstract
Methods for recovery of precursor vapor from a gas and precursor vapor mixture used in a deposition process. The gas and precursor vapor mixture is passed through a multitude of heat transfer surfaces in a heat conducting housing causing the precursor vapor to condense. The precursor vapor in liquid form is then collected after condensation.
Claims6
A method for recovery of precursor vapor from a gas and precursor mixture after use in deposition in a semiconductor fabrication process, the method comprising:
- directing said gas and precursor mixture after deposition to pass through a multitude of heat transfer surfaces in a heat conducting housing causing precursor vapor in said gas and precursor mixture to condense;
- and
- collecting precursor liquid formed from the precursor vapor condensation in a reservoir.
A method of fabricating integrated circuit devices including the steps of:
- generating a gas and precursor vapor mixture;
- passing said gas and precursor vapor mixture through a deposition chamber to form a thin film on a substrate;
- and
- condensing precursor vapor of said gas and precursor vapor mixture in a condenser to collect condensed precursor vapor in liquid form.
1 more element
Dependencies are inferred from the claim text.