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AssigneeWacker Chemie AG
InventorsHarald HERTLEIN, Rainer HAUSWIRTH, Dieter WEIDHAUS
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Granular polycrystalline silicon includes a compact matrix including radiating acicular crystal aggregates of crystal size from 0.001-200 μm. A process for producing granular polycrystalline silicon includes producing granular silicon in a fluidized bed reactor from a gas mixture containing TCS (20-29 mol %) and hydrogen at a fluidized bed temperature of 900-970° C., dividing the granular silicon in a screen system having at least one screen deck into at least two screen fractions, the smallest screen fraction being ground in a grinding system to give seed particles having a size of 100-1500 μm and a mass-based median value from 400 to 900 μm, and these seed particles being supplied to fluidized bed reactor, and a further screen fraction being supplied to a fluidized bed reactor, and being surface-treated with a gas mixture containing TCS (5.1-10 mol %) and hydrogen at a fluidized bed temperature of 870-990° C.
Granular polycrystalline silicon comprising a compact matrix comprising radiating acicular crystal aggregates having a crystal size from 0.001 to 200 μm.
Granular polycrystalline silicon comprising a compact matrix and a surface layer, wherein the compact matrix and surface layer include acicular crystals arranged in parallel.
Granular polycrystalline silicon free of inclusions of ultrafine particles within a size range from 1 nm to less than 10 μm.
A method of using nanoscale crystalline silicon particles which are discharged with an offgas from a fluidized bed reactor for production of granular polycrystalline silicon for production of printable solar cells or for production of anode material for lithium ion batteries.
Dependencies are inferred from the claim text.