Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample

An ion beam machining and observation device comprising:

• a vacuum chamber and a gas supply mechanism to introduce gas into the vacuum chamber, a gas field ion source to generate gas ions in the vacuum chamber, a sample chamber for storing a sample, and an ion beam irradiation column connected to the vacuum chamber to extract an ion beam from the gas field ion source and irradiate the ion beam onto the sample;
• wherein the gas supply mechanism includes at least two gas introduction systems, each system having a gas cylinder, a gas volume control valve and a stop valve;
• and
• further comprising:
• a gas switching control unit for controlling the gas volume control valve of each system so as to be capable of setting up gas pressure conditions for the vacuum chamber, and the stop valve of each system so as to be capable of switching the kind of gas being introduced into the vacuum chamber;
• wherein the gas switching control unit has a control unit to be capable of field evaporation of a pyramid structure of atoms at an apex of an emitter tip of the gas field ion source when the gas switching control unit switches a kind of gas being introduced into the vacuum chamber by the stop valve of each system.

An ion beam machining and observation device comprising:

• a vacuum chamber and a gas supply mechanism to introduce gas into the vacuum chamber, a gas field ion source to generate gas ions in the vacuum chamber, a sample chamber for storing a sample, and an ion beam irradiation column connected to the vacuum chamber to extract an ion beam from the gas field ion source and irradiate the ion beam onto the sample;
• wherein the gas supply mechanism includes at least two gas introduction systems, each system having a gas cylinder, a gas volume control valve and a stop valve;
• and
• further comprising:
• a gas introduction control unit for controlling the gas volume control valve of each system so as to be capable of setting up gas pressure conditions for the vacuum chamber, and the stop valve of each system so as to be capable of mixing at least two kinds of gases and introducing the mixed gas into the vacuum chamber.