Light emitting device and method of manufacturing the same
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsHirokazu YAMAGATA, Shunpei YAMAZAKI, Toru TAKAYAMA
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AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsHirokazu YAMAGATA, Shunpei YAMAZAKI, Toru TAKAYAMA
Estimating the term…
A high-quality light emitting device is provided which has a long-lasting light emitting element free from the problems of conventional ones because of a structure that allows less degradation, and a method of manufacturing the light emitting device is provided. After a bank is formed, an exposed anode surface is wiped using a PVA (polyvinyl alcohol)-based porous substance or the like to level the surface and remove dusts from the surface. An insulating film is formed between an interlayer insulating film on a TFT and the anode. Alternatively, plasma treatment is performed on the surface of the interlayer insulating film on the TFT for surface modification.
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A method for manufacturing a light emitting device, comprising the steps of:
A method for manufacturing a light emitting device, comprising the steps of:
A method for manufacturing a light emitting device, comprising the steps of:
Dependencies are inferred from the claim text.