Method and system for producing high resolution patterns in registration on the surface of a substrate
AssigneeeMagin Corporation
InventorsAmalkumar P. Ghosh, Ronald W. Wake
Life of this patent
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AssigneeeMagin Corporation
InventorsAmalkumar P. Ghosh, Ronald W. Wake
Estimating the term…
A method of selectively applying a material to a surface of a substrate from a stamp with a raised surface using an energy activated release layer is provided. The release layer is applied to at least a first portion of a surface of the stamp. A layer of the material is applied to the raised surface of the stamp. The raised surface of the stamp is placed in contact with the surface of the substrate such that the material layer is situated therebetween. Thereafter, the release layer is activated with energy, causing the material layer to release from the raised surface of the stamp, and to adhere to the surface of the substrate. Alternatively, the entire stamp surface may be coated with the release layer and the release layer may be selectively activated in the areas in which the material on the stamp surface is in contact with the substrate.
A method of selectively applying a material to a surface of a substrate from a stamp with a raised surface and using an energy activated release layer, the method comprising the steps of:
A method of producing high resolution patterns on a surface of a substrate, comprising:
Dependencies are inferred from the claim text.