Transparent conductive film and manufacturing method therefor
AssigneeNitto Denko Corporation
InventorsYuka Yamazaki, Yoko Muraoka, Hironobu Machinaga, Tomotake Nashiki, Tsukasa Miyazaki
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Abstract
The present invention relates to a transparent conductive film which is excellent in dotting property under a heavy load and excellent in bending resistance. Provided is a transparent conductive film, comprising a flexible transparent base; and a transparent conductive layer formed on the flexible transparent base and including a crystalline indium/tin composite oxide, wherein a compressive residual stress of the transparent conductive layer is 0.4 to 2 GPa.
Claims6
A transparent conductive film, comprising
- a flexible transparent base;
- and
- a transparent conductive layer formed on the flexible transparent base and including a crystalline indium/tin composite oxide,
- wherein a compressive residual stress of the transparent conductive layer is 0.4 to 2 GPa.
A method for manufacturing a transparent conductive film comprising a flexible transparent base;
- and a transparent conductive layer formed on the flexible transparent base and including a crystalline indium/tin composite oxide, the method comprising
- a base providing step of providing a flexible transparent base;
- a film formation step of forming an amorphous transparent conductive layer including an amorphous indium/tin composite oxide on the flexible transparent base;
- and
- a heat treatment step of heating the amorphous transparent conductive layer to be converted into a crystalline indium/tin composite oxide,
- wherein in the heat treatment step, a compressive stress is given to the transparent conductive layer in at least one direction in the plane.
Dependencies are inferred from the claim text.