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AssigneeBoard of Regents, The University of Texas System
InventorsCarlton Grant Wilson, Christopher John Ellison, Takehiro Seshimo, Julia Cushen, Christopher M. Bates, Leon Dean, Logan J. Santos, Erica L. Rausch
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The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.
A method of applying a top coat to a block copolymer film to create a layered structure, comprising:
A layered structure comprising first, second and third layers on a surface, wherein said first layer comprises a crosslinked polymer, wherein said second layer comprises a block copolymer film, and wherein said third layer comprises maleic anhydride.
A layered structure comprising first, second and third layers on a surface, wherein said first layer comprises a maleic anhydride based substrate neutralization layer, wherein said second layer comprises a block copolymer film, and wherein said third layer comprises maleic anhydride.
A method to achieve block copolymer domain orientation by
Dependencies are inferred from the claim text.