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US 2013/0280425 A1Published application
Liquid treatment apparatus and method and non-transitory storage medium
AssigneeTokyo Electron Limited
InventorsYuichi YOSHIDA, Kousuke YOSHIHARA
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Abstract
A liquid treatment method includes: supplying a first organic solvent to a substrate with the substrate being held horizontally by a substrate holder; and thereafter supplying a second organic solvent to a substrate held by the substrate holder, the second solvent having a higher cleanliness than the first solvent.
Claims15
A liquid treatment apparatus comprising:
- a substrate holder configured to hold a substrate horizontally;
- at least one nozzle configured to supply an organic solvent to a substrate held by the substrate holder;
- a first organic solvent supply mechanism configured to supply a first solvent to said at least one nozzle;
- a second organic solvent supply mechanism configured to supply a second solvent to said at least one nozzle, the second solvent having a higher cleanliness than the first solvent;
- and
- a controller configured to control the first and second organic solvent supply mechanisms such that said at least one nozzle supplies a substrate with the first organic solvent and then supplies the substrate with the second organic solvent.
3 more elements
A liquid treatment method comprising:
- supplying a first organic solvent to a substrate with the substrate being held horizontally by a substrate holder;
- thereafter supplying a second organic solvent to a substrate held by the substrate holder, the second solvent having a higher cleanliness than the first solvent.
Dependencies are inferred from the claim text.