Charged particle beam device and method of manufacture of sample

A method for creating a sample using a charged particle beam device having an ion source, an ion beam optics system apparatus for irradiating an ion beam, a first control unit for controlling the irradiation of the ion beam, an electron source, an electron beam optics system apparatus for irradiating an electron beam, a second control unit for controlling the irradiation of the electron beam, a sample holding mechanism for holding a sample, a vacuum container, and a two-dimensional detector for acquiring a diffraction pattern which is created by electrons passing through the sample out of the electron beam, comprising the steps of:

• calculating an amount of blur of the diffraction pattern at a time of removal machining of a damaged layer of the sample with the ion beam;
• and
• controlling a moment for stopping irradiation of the ion beam to the sample based on the amount of blur.