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OwnerMohammed Mahbubul Aheem, William Brock Alexander +3inventors
InventorsMohammed Mahbubul Aheem, William Brock Alexander, Sang-ho Lee, Thomas Mercer, Vasil Vorsa
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Included within the scope of the invention are plasma etch-resistant films for substrates. The films include a yttria material and a at least a portion of the yttria material is in a crystal phase having an orientation defined by a Miller Index notation {111}. Also included are methods of manufacturing plasma etch-resistant films on a substrate. Such methods include applying a yttria material-containing composition onto at least a portion of a surface of a substrate to form a film. The film includes a yttria material and at least a portion of the yttria material is in a crystal phase having an orientation defined by a Miller Index notation {111}.
A plasma etch-resistant film for a substrate comprising a yttria material wherein at least a portion of the yttria material is in a crystal phase having an orientation defined by a Miller Index notation {111}.
A method of manufacturing a plasma etch-resistant film on a substrate comprising depositing a yttria material-containing composition onto at least a portion of a surface of a substrate to form a film, wherein the film comprises a yttria material and at least a portion of the yttria material is in a crystal phase having an orientation defined by a Miller Index notation {111}.
-75. (canceled)
Dependencies are inferred from the claim text.