Cvd apparatus and cvd method

A CVD apparatus characterized in that

• the apparatus comprises:
• a vacuum vessel;
• magnetic-field producing means for producing a magnetic field inside the vacuum vessel;
• a substrate holder having an electrode thereinside and configured to hold a substrate inside the vacuum vessel;
• a power source configured to apply voltage for producing a plasma in the vacuum vessel to the electrode;
• and
• a shield provided inside the vacuum vessel at a position opposite from the substrate holder,
• the magnetic-field producing means is located between an inner wall of the vacuum vessel and the shield,
• the shield is grounded, and
• an electrode connected to the power source is not provided on an opposite side from the substrate holder.

A CVD method for performing a film formation process on a substrate in a vacuum vessel having thereinside a substrate holder which is holding the substrate, magnetic-field producing means which is producing a magnetic field, and a shield provided at a position opposite from the substrate holder and grounded, the magnetic field-producing means being located between an inner wall of the vacuum vessel and the shield, the method comprising the steps of:

• introducing a source gas into a space between the magnetic-field producing means and the substrate holder;
• producing a plasma of the source gas by applying voltage to the substrate holder;
• and
• forming a film on the substrate by the plasma of the source gas.