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AssigneesMasayuki Toda, Kabushiki Kaisha Watanabe Shoko
InventorsMasayuki TODA, Masaki KUSUHARA, Masaru UMEDA, Mitsuru FUKAGAWA
Estimating the term…
Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.
An evaporation method of bringing in a carrier gas from one end of a gas passage and delivering a carrier gas containing a raw material solution from an issuing part connected to the other end of the gas passage to an evaporating unit for evaporation, the method comprising the step of:
The film deposition method according to claim 10, wherein the film deposition method is an MOCVD method.
Dependencies are inferred from the claim text.