US 2013/0260574 A1 · SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Abstract

In a substrate processing apparatus, with an internal space of a chamber brought into a reduced pressure atmosphere, a first processing liquid is supplied onto an upper surface of a substrate while the substrate is rotated, and the first processing liquid is thereby quickly spread from a center portion toward a peripheral portion on the upper surface of the substrate. It is thereby possible to coat the upper surface of the substrate with the first processing liquid in a shorter time as compared with under normal pressure. Further, by sucking the first processing liquid from the vicinity of an edge of the substrate, it is possible to coat the upper surface of the substrate with the first processing liquid in a still shorter time. As a result, it is possible to shorten the time required for the processing of the substrate.

Claims22

Dependent claims

A substrate processing apparatus for processing a substrate, comprising:

a substrate holding part for holding a substrate with a main surface thereof directed upward;
a processing liquid supply part for supplying a processing liquid onto a center portion of said main surface of said substrate;
a substrate rotating mechanism for rotating said substrate together with said substrate holding part;
a chamber for containing said substrate holding part in an internal space thereof;
a pressure changing part for changing pressure in said internal space of said chamber;
and
a control part for controlling said processing liquid supply part, said substrate rotating mechanism, and said pressure changing part to bring said internal space of said chamber into a reduced pressure atmosphere and supply said processing liquid onto said main surface of said substrate while rotating said substrate in said reduced pressure atmosphere, to thereby coat said main surface of said substrate with said processing liquid.

4 more elements

Dependencies are inferred from the claim text.

Substrate processing apparatus and substrate processing method

Life of this patent

Substrate processing apparatus and substrate processing method

Life of this patent

Abstract

Claims22