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US 2013/0260293 A1Published application
Photomask, and pattern formation method and exposure apparatus using the photomask
AssigneePanasonic Corporation
InventorsAkio MISAKA, Masaru SASAGO
Life of this patent
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Abstract
A photomask includes a translucent substrate; and a light-shielding film formed on the translucent substrate, and including a light-shielding portion and an opening which serves as a translucent region. A plurality of recesses are formed in a region of the translucent substrate, which is exposed from the opening. Widths of the plurality of recesses gradually increase with an increase in distances from a focal point so that light transmitted by the plurality of recesses is focused in a predetermined position.
Claims25
A photomask comprising:
- a translucent substrate;
- and
- a light-shielding film formed on the substrate, and including a light-shielding portion and an opening which serves as a translucent region, wherein
- a plurality of recesses are formed in a region of the substrate, which is exposed from the opening,
- widths of the plurality of recesses gradually increase with an increase in distances from a focal point so that light transmitted by the plurality of recesses is focused in a predetermined position.
2 more elements
A photomask comprising:
- a translucent substrate;
- and
- a light-shielding film formed on the substrate, and including a light-shielding portion and an opening which serves as a translucent region, wherein
- a plurality of recesses are formed in a region of the substrate, which is exposed from the opening,
- widths of first recesses of the plurality of recesses gradually increase with an increase in distances from a first focal point so that light transmitted by the first recesses is focused in a predetermined position, and
- widths of second recesses of the plurality of recesses gradually increase with an increase in distances from a second focal point, which is different from the first focal point, so that light transmitted by the second recesses is focused in another predetermined position.
3 more elements
Dependencies are inferred from the claim text.