Pzt-based ferroelectric thin film and method of manufacturing the same
AssigneeMitsubishi Materials Corporation
InventorsTakashi Noguchi, Toshihiro Doi, Hideaki Sakurai, Toshiaki Watanabe, Nobuyuki Soyama
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AssigneeMitsubishi Materials Corporation
InventorsTakashi Noguchi, Toshihiro Doi, Hideaki Sakurai, Toshiaki Watanabe, Nobuyuki Soyama
Estimating the term…
A PZT-based ferroelectric thin film formed on a lower electrode of a substrate having the lower electrode in which the crystal plane is oriented in a (111) axis direction, having an orientation controlling layer which is formed on the lower electrode and has a layer thickness in which a crystal orientation is controlled in a (111) plane preferentially in a range of 45 nm to 270 nm, and a film thickness adjusting layer which is formed on the orientation controlling layer and has the same crystal orientation as the crystal orientation of the orientation controlling layer, in which an interface is formed between the orientation controlling layer and the film thickness adjusting layer.
A PZT-based ferroelectric thin film formed on a lower electrode of a substrate having the lower electrode in which a crystal plane is oriented in a (111) axis direction, comprising:
A method of manufacturing a PZT-based ferroelectric thin film on a lower electrode by coating, calcining, and then firing so as to crystallize a PZT-based ferroelectric thin film-forming composition on the lower electrode of a substrate having the lower electrode in which a crystal plane is oriented in a (111) axis direction,
Dependencies are inferred from the claim text.