Substrate processing system having symmetric rf distribution and return paths

A substrate processing system, comprising:

• a target having a front side and an opposing backside, and a central axis normal to the front side and the backside, the target including a source material disposed on the front side, the source material to be deposited on a substrate;
• a source distribution plate having a first diameter bisected by the central axis and disposed between a first peripheral edge, the source distribution plate further having a target facing side opposing the backside of the target and a target opposing side opposite the target facing side, wherein the source distribution plate is electrically coupled to the target along a peripheral edge of the target, and wherein the source distribution plate includes a plurality of first features disposed in the target opposing side and about the central axis such that a first distance of a first radial RF distribution path between the central axis and the first peripheral edge along a given first diameter is about equal to a second distance of an opposing second radial RF distribution path between the central axis and the first peripheral edge along the given first diameter;
• a ground plate opposing the target opposing side of the source distribution plate, the ground plate having a second diameter bisected by the central axis and disposed between a second peripheral edge, the grounding plate further having a plurality of second features disposed about the central axis and corresponding to the plurality of first features, wherein a third distance of a first radial RF return path between the second peripheral edge and the central axis along a given second diameter is about equal to a fourth distance of an opposing second radial RF return path between the second peripheral edge and the central axis along the given second diameter;
• an RF feed structure coupled to the source distribution plate to provide RF energy to the source distribution plate, wherein the RF feed structure is aligned with the central axis;
• a cavity disposed between the backside of the target and the source distribution plate;
• and
• a magnetron assembly comprising a rotatable magnet disposed within the cavity and having an axis of rotation that is aligned with a central axis of the target.

A substrate processing system, comprising:

• a target having a front side and an opposing backside, and a central axis normal to the front side and the backside, the target including a source material disposed on the front side, the source material to be deposited on a substrate;
• a source distribution plate having a first diameter bisected by the central axis and disposed between a first peripheral edge, the source distribution plate further having a target facing side opposing the backside of the target and a target opposing side opposite the target facing side, wherein the source distribution plate is electrically coupled to the target along a peripheral edge of the target, and wherein the source distribution plate includes a plurality of first features symmetrically disposed in the target opposing side and about the central axis such that a first distance of a first radial RF distribution path between the central axis and the first peripheral edge along a given first diameter is about equal to a second distance of an opposing second radial RF distribution path between the central axis and the first peripheral edge along the given first diameter;
• a ground plate opposing the target opposing side of the source distribution plate, the ground plate having a second diameter bisected by the central axis and disposed between a second peripheral edge, the grounding plate further having a plurality of second features symmetrically disposed about the central axis and corresponding to the plurality of first features, wherein a third distance of a first radial RF return path between the second peripheral edge and the central axis along a given second diameter is about equal to a fourth distance of an opposing second radial RF return path between the second peripheral edge and the central axis along the given second diameter;
• and
• an RF feed structure coupled to the source distribution plate to provide RF energy to the source distribution plate, wherein the RF feed structure is aligned with the central axis.