Manufacturing method of reflective layer for reflective type liquid crystal

A manufacturing method of a reflective layer for the reflective type liquid crystal display, comprising:

• providing a substrate, wherein the substrate comprising a reflective area and a non-reflective area;
• coating a photoresist to cover the non-reflective area of the substrate;
• placing the substrate in a sputtering chamber for depositing a reflective metal layer on the reflective area;
• and
• passing a reaction gas into the sputtering chamber, and using radio frequency (RF) magnetron sputtering method to bombard the surface of the reflective metal layer so that the surface of the reflective metal layer and the reaction gas react to form a metal compound as the reflective layer.

A manufacturing method of a reflective layer for a reflective type liquid crystal display, comprising:

• providing a substrate, wherein the substrate comprising a reflective area and a non-reflective area;
• using a photoresist to cover the non-reflective area of the substrate;
• placing the substrate into the sputtering chamber for depositing an electrode metal layer on the reflective area of the substrate;
• and
• passing a reaction gas into the sputtering chamber, and depositing a metal for the reflective layer such that the metal is reacting with the react gas to form a metal compound as the reflective layer when it is being deposited on the surface of the electrode metal layer.