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US 2013/0252519 A1Published application
Self-conditioning polishing pad and a method of making the same
AssigneeJH Rhodes Company, Inc.
InventorScott B. Daskiewich
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Abstract
The present invention is directed to a self conditioning polishing pad. The self-conditioning polishing pad comprises an insoluble polymeric foam matrix and insoluble polymeric foam particles within the foam matrix. The particles are coated with a water-soluble component over a portion of the surface area of the particle. The particles may have a diameter in the range of 5 to 1000 microns in diameter.
Claims19
A polishing pad comprising:
- an insoluble polymeric foam matrix;
- and
- a plurality of coated particles, wherein said plurality of coated particles each comprise insoluble polymeric foam particles coated with a water-soluble component.
A method of producing a self-conditioning polishing pad comprising:
- forming a plurality of coated insoluble polymeric foam particles;
- preparing a prepolymer solution;
- mixing said prepolymer solution in an open-air mix, wherein at least one of a gas bubble and a blowing agent are added to said open-air mix;
- adding said plurality of insoluble polymeric foam particles to the mix, wherein said plurality of coated insoluble polymeric foam particles comprise a plurality of insoluble polymeric foam particles that are coated with a water-soluble component;
- adding a polymerizing agent to the mix;
- allowing the mixture to foam;
- pouring said mixture into an open mold;
- curing said mixture to form a foam bun wherein said foam bun has an aggregated bulk density of 0.2 to 0.85 g/cm̂3;
- and
- forming a foamed polishing pad out of said foam bun by slicing individual pads out of said foam bun.
7 more elements
Dependencies are inferred from the claim text.