Wafer Holder With Varying Surface Property

A wafer processing system, comprising:

• a wafer process chamber;
• a wafer holder located in the wafer process chamber;
• a plurality of backside radiant heat elements;
• and
• at least one system coupled to the wafer process chamber and operable to perform at least wafer processing process on a wafer located on the wafer holder in the wafer process chamber,
• wherein the wafer holder includes:
• a wafer contact portion configured to hold an overlying wafer, the wafer contact portion including a central region and an edge region circumscribing the central region;
• and
• an exterior portion extending beyond an outer radius of the wafer,
• wherein the central region has a radius within the range of from about 70 percent to about 90 percent of the outer radius of the wafer,
• wherein the central region has a first reflective characteristic, and
• wherein the edge region and the exterior portion have a second reflective characteristic different than the first reflective characteristic.

A method comprising:

• providing a wafer process chamber and a plurality of radiant heat elements under the wafer process chamber;
• receiving a wafer holder configured to be used in the wafer process chamber;
• and
• processing a wafer located on the wafer holder in the wafer process chamber,
• wherein the processing includes using the radiant heat elements to heat the wafer,
• wherein the wafer holder includes:
• a wafer contact portion configured to hold an overlying wafer, the wafer contact portion including a central region and an edge region circumscribing the central region;
• and
• an exterior portion extending beyond an outer radius of the wafer,
• wherein the central region has a radius within the range of from about 70 percent to about 90 percent of the outer radius of the wafer,
• wherein the central region has a first reflective characteristic,
• wherein the edge region and the exterior portion have a second reflective characteristic different than the first reflective characteristic, and
• wherein the wafer holder includes quartz.