Liquid Deposition Photolithography

A system for liquid deposition photolithography comprising:

• an exposure chamber;
• an optical window into the exposure chamber;
• a base platform configured to articulate a part with respect to the optical window;
• a pattern generator configured to project an optical pattern onto the part through the optical window to thereby modify properties of a layer of photo-sensitive liquid between the and the optical window;
• and
• a material delivery system for delivering materials into the exposure chamber, the materials including the photo-sensitive liquid and an inhibitor that maintains the photo-sensitive liquid in liquid form adjacent to the optical window.

A method of liquid deposition photolithography comprising:

• selecting a photo-sensitive liquid to build a layer of a structure;
• inserting a layer of the photo-sensitive liquid within an exposure chamber between an optical window and a mold for creating the structure;
• releasing a radical inhibitor to maintain a layer of material precursors adjacent to the optical window, wherein the layer of material precursors is not photo-sensitive;
• modifying the properties of the layer of the photo-sensitive liquid, wherein modifying the properties include projecting an optical pattern through the optical window;
• and
• adjusting a position or orientation of a base platform in accordance with a trajectory profile before repeating the above steps a plurality of times to build the structure layer by layer.