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US 2013/0252170 A1Published application
Polymer Compound, And Resist-Protecting Film Composition Including Same For A Liquid Immersion Exposure Process
AssigneeDongjin Semichem Co., Ltd.
InventorsMan Ho Han, Jong Kyoung Park, Hyun Jin Kim, Jae Hyun Kim
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Abstract
A polymer compound and a resist protective film composition for an immersion lithography process including the same.
Claims21
A polymer compound comprising:
- 100 parts by mole of a repeating unit represented by Formula 1;
- 10 to 900 parts by mole of a repeating unit represented by Formula 2;
- and 10 to 900 parts by mole of a repeating unit represented by Formula 3, wherein the polymer compound has a weight average molecular weight of 1,000 to 100,000:
- wherein R1, R3, R4, R5, and R6 are each independently a hydrogen atom, a fluorine atom, or a substituted or unsubstituted C1-C20 alkyl group,
- R2 is a substituted or unsubstituted C1-C10 alkyl group or a substituted or unsubstituted C1-C10 cyclic alkyl group, wherein at least one hydrogen atom of the C1-C10 alkyl group and the C1-C10 cyclic alkyl group is substituted with a group represented by Formula a,
- R7 is a hydrogen atom or a substituted or unsubstituted C1-C25 alkyl group,
- wherein R8 is a hydrogen atom or a substituted or unsubstituted C1-C25 alkyl group, R9 is a single bond or a substituted or unsubstituted C1-C10 alkylene group, and * indicates a binding site.
4 more elements
Dependencies are inferred from the claim text.