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US 2013/0252146 A1Published application
Projection Exposure Tool for Microlithography and Method for Microlithographic Imaging
AssigneeCarl Zeiss SMT GmbH
InventorsJochen Hetzler, Aksel Goehnermeier
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Abstract
A projection exposure tool for microlithography for imaging mask structures of an image-providing substrate onto a substrate to be structured includes a measuring apparatus configured to determine a relative position of measurement structures disposed on a surface of one of the substrates in relation to one another in at least one lateral direction with respect to the substrate surface and to thereby simultaneously measure a number of measurement structures disposed laterally offset in relation to one another.
Claims20
A tool, comprising:
- a measuring apparatus configured to determine a relative position of measurement structures relative to each other in a lateral direction,
- wherein:
- the tool is a microlithography projection exposure tool configured to image mask structures of a first substrate onto a second substrate which is different from the first substrate;
- the measurement structures are disposed on a surface of the first substrate, or the measurement structures are disposed on a surface of the second substrate;
- and
- the measuring apparatus is configured so that, during use of the measuring apparatus, the measuring apparatus simultaneously measures a number of measurement structures which are laterally offset relative to each other.
3 more elements
A method, comprising:
- determining a relative position of measurement structures in a lateral direction with a respect to a substrate on which the measurement structures are disposed by simultaneously measuring a number of measurement structures which are laterally offset relative to each other, the substrate being a first substrate or a second substrate;
- and
- using a microlithography projection exposure tool to image mask structures on the first substrate onto the second substrate while simultaneously locally varying an imaging parameter based on the lateral position measurements.
A method, comprising:
- determining a relative position of measurement structures relative to each other in a lateral direction with respect to a substrate on which the measurement structures are disposed by simultaneously interferometrically measuring a number of the measurement structures which are laterally offset relative to each other.
Dependencies are inferred from the claim text.