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US 2013/0251908 A1Published application
Acid etch resistance for calcareous substrates
AssigneeE. I. Du Pont de Nemours and Company
InventorsBrad M. Rosen, Siddhartha R. Shenoy, Anilkumar Raghavanpillai, Ernest Bryon Wysong, Joel M. Pollino, James J. Hughes, John Russell Crompton, JR.
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Abstract
A method to provide acid etch resistance to contacting a calcareous substrate with a copolymer prepared from fluorinated methacrylate, short chain branched (meth)acrylate, and (meth)acrylic acid salt and a treated substrate.
Claims20
A method of providing acid etch resistance, water repellency, oil repellency and stain resistance to a substrate surface comprising contacting the substrate surface with a copolymer of formula (I)
- wherein
- Rf is C1 to C10 linear or branched fluoroalkyl, optionally interrupted by one or more —O—, —CH2—, —CFH—, or combinations thereof;
- Q is an alkylene of 1 to about 15 carbon atoms, hydroxyalkylene of 3 to about 15 carbon atoms, —(CnH2n)(OCqH2q)m—, —(CnH2n)(NR′)z—SO2—NR′(CnH2n)—, or —CONR′(CnH2n)—, wherein each R′ is independently H or an alkyl of from 1 to about 4 carbon atoms, n is independently 1 to about 15, q is 2 to about 4, m is 1 to about 15, and z is 0 or 1;
- Ra is a C3 to C4 branched alkyl;
- M is H, NH4, Na, Li, Cs, K, HNR3 or mixtures thereof;
- R is C1 to C4 linear or branched alkyl;
- a is an integer from about 20 to about 50 mol %;
- b is an integer from about 5 to about 35 mol %;
- and
- c is an integer from about 15 to about 60 mol %;
- wherein the sum of a+b+c is equal to 100%.
8 more elements
Dependencies are inferred from the claim text.