Thin-film transistor array substrate and manufacturing method thereof

A manufacturing method of a thin-film transistor array substrate, wherein the method comprises steps of:

• providing a glass substrate, forming a first metallic layer on the glass substrate and performing an etching treatment to the first metallic layer to form multiple scanning lines;
• orderly depositing an insulating layer and a semiconductor layer on the first metallic layer;
• forming a second metallic layer on the semiconductor layer and performing an etching treatment to the second metallic layer to form multiple data lines;
• and
• depositing a passivation layer on the second metallic layer and forming a transparent electrode layer on the passivation layer;
• wherein
• the first metallic layer and the second metallic layer each has a multilayer structure;
• the multilayer structure includes a primary electrically conductive layer and at least one blocking layer;
• the primary electrically conductive layer has a restraining metallic layer mounted therein and having a melting point higher than a melting point of the primary electrically conductive layer.