Fast response fluid temperature control system

A plasma processing apparatus, comprising:

• a process chamber including a temperature controlled component;
• a first heat transfer fluid loop comprising a first heat exchanger having a primary side in fluid communication with a heat sink;
• a second heat transfer fluid loop comprising a second exchanger having a primary side in fluid communication with a heat source
• a third heat transfer fluid loop placing the temperature controlled component in parallel fluid communication with secondary sides of both the first and second heat exchangers, wherein the third heat transfer fluid loop further comprises:
• a pump disposed between the temperature controlled component and the secondary sides of first and second heat exchangers to circulate a heat transfer liquid through the third heat transfer fluid loop;
• a bypass disposed between inlet and outlets of the secondary sides of the first and second heat exchangers;
• and
• a mixing valve disposed between the temperature controlled component and the secondary sides of the first and second heat exchangers, and the bypass to apportion first heat transfer fluid rates of flow between the first heat exchanger, second heat exchanger, and bypass.

A method of controlling a temperature of a component in a plasma processing apparatus, the method comprising:

• providing a first heat transfer fluid at a first temperature to a first heat exchanger;
• providing a second heat transfer fluid at a second temperature to a second heat exchanger;
• controlling a temperature of the third heat transfer fluid by apportioning a rate of flow of the third heat transfer fluid between the first and second heat exchangers;
• and
• providing the third heat transfer fluid to the component.