Loading patent…
AssigneePANalytical B.V.
InventorsFrederik Bijkerk, Wilfred Gerard Van Der Wiel, Robert Van Der Meer, Petronella Emerentiana Hegeman
Estimating the term…
Method for manufacturing a multilayer structure with a lateral pattern, in particular of an optical grating for application in an optical device for electromagnetic radiation with a wavelength in the wavelength range between 0.1 nm and 100 nm, comprising the steps of (i) providing a multilayer structure, and (ii) arranging a lateral three-dimensional pattern in the multilayer structure, wherein step (ii) of arranging the lateral pattern is performed by means of a method for nano-imprint lithography (NIL), and BF and LMAG structures manufactured according to this method.
Method for manufacturing a multilayer structure with a lateral pattern, in particular of an optical grating for application in an optical device for electromagnetic radiation with a wavelength in the wavelength range between 0.1 nm and 100 nm, comprising the steps of
Method as claimed in any of the foregoing claims, wherein step (ii) of arranging the lateral pattern is followed by step (iii) of applying a cover layer over the three-dimensional pattern.
Dependencies are inferred from the claim text.