Method for fabricating template
OwnerTakeshi KOSHIBAinventor
Life of this patent
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Abstract
According to one embodiment, a method for fabricating a template, includes providing a mask pattern on a template substrate, processing the template substrate using the mask pattern as a mask so as to provide a first pattern on a first area in the template substrate and a second pattern on a second area which is located adjacent to the first area in the template, providing a first mask material on the template substrate so as to cover the first area, and processing the second area using the first mask material as a mask so as to lower a height of a surface of the second area than a height of a surface of the first area.
Claims20
A method for fabricating a template, comprising:
- providing a mask pattern on a template substrate;
- processing the template substrate using the mask pattern as a mask so as to provide a first pattern on a first area in the template substrate and a second pattern on a second area which is located adjacent to the first area in the template;
- providing a first mask material on the template substrate so as to cover the first area;
- and
- processing the second area using the first mask material as a mask so as to lower a height of a surface of the second area to a height of a surface of the first area.
A method for fabricating a template, comprising:
- providing a mask pattern on a first template substrate;
- processing the first template substrate using the mask pattern as a mask so as to provide a first pattern in a first area in the first template substrate and a second pattern in a second area adjacent to the first area in the first template substrate;
- coating a filling material on a second template substrate;
- contacting the first template substrate to the second template substrate on which the filling material is coated so as to fill the filling material into the first pattern and the second pattern;
- irradiating light to the filling material so as to harden the filling material;
- releasing the first template substrate from the second template substrate;
- processing the second template substrate using the filling material as a mask so as to provide a third pattern in a third area and a fourth pattern in a fourth area adjacent to the third pattern in the second template substrate;
- providing a first mask to cover the third area;
- and
- processing the fourth area using the first mask as a mask so as to decrease a height of a surface of the fourth area to a height of a surface of the third area.
Dependencies are inferred from the claim text.