Method for fabricating an isolation structure

A method of fabricating an isolation structure, the method comprising:

• forming a trench in a top surface of a substrate;
• partially filling the trench with a first oxide, wherein partially filling the trench comprises forming an overhang;
• removing the overhang, wherein removing the overhang comprises:
• converting the overhang to a solid reaction product;
• sublimating the solid reaction product;
• removing the sublimated solid reaction product by flowing a carrier gas over the substrate;
• and
• filling the trench with a second oxide.

A method of fabricating an isolation structure, the method comprising:

• forming a trench in a top surface of a substrate (paragraph 0015);
• partially filling the trench with a first oxide, wherein the first oxide has a thickness ranging from about 300 Angstroms (Å) to about 2000 Å;
• removing a first portion of the first oxide, wherein removing the first portion of the first oxide comprises:
• producing a first solid reaction product in the first portion;
• sublimating the first solid reaction product;
• removing the sublimated first solid reaction product by flowing a carrier gas over the substrate;
• removing a second portion of the first oxide, wherein removing the second portion of the first oxide comprises:
• producing a second solid reaction product in the second portion;
• sublimating the second solid reaction product;
• removing the sublimated second solid reaction product by flowing a carrier gas over the substrate;
• and
• filling the trench with a second oxide.