Library generation with derivatives in optical metrology
OwnerLie-Quan Lee, Leonid Poslavskyinventors
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Abstract
Methods of library generation with derivatives for optical metrology are described. For example, a method of generating a library for optical metrology includes determining a function of a parameter data set for one or more repeating structures on a semiconductor substrate or wafer. The method also includes determining a first derivative of the function of the parameter data set. The method also includes providing a spectral library based on both the function and the first derivative of the function.
Claims23
A method of generating a library for optical metrology, the method comprising:
- determining a function of a parameter data set for one or more repeating structures on a semiconductor substrate or wafer;
- determining a first derivative of the function of the parameter data set;
- and
- providing a spectral library based on both the function and the first derivative of the function.
A non-transitory machine-accessible storage medium having instructions stored thereon which cause a data processing system to perform a method of generating a library for optical metrology, the method comprising:
- determining a function of a parameter data set for one or more repeating structures on a semiconductor substrate or wafer;
- determining a first derivative of the function of the parameter data set;
- and
- providing a spectral library based on both the function and the first derivative of the function.
A system to generate a simulated diffraction signal to determine process parameters of a wafer application to fabricate a structure on a wafer using optical metrology, the system comprising:
- a fabrication cluster configured to perform a wafer application to fabricate a structure on a wafer, wherein one or more process parameters characterize behavior of structure shape or layer thickness when the structure undergoes processing operations in the wafer application performed using the fabrication cluster;
- an optical metrology system configured to determine the one or more process parameters of the wafer application, the optical metrology system comprising:
- a beam source and detector configured to measure a diffraction signal of the structure;
- a spectral library of simulated diffraction signals, the spectral library based on both a function and a first derivative of the function of a parameter data set of a plurality of model structures;
- and
- a processor configured to determine, from the plurality of model structures, a model of the structure.
Dependencies are inferred from the claim text.