Expandable Interspinous Device
AssigneePhygen, LLC
InventorBryan Okamoto
Life of this patent
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Abstract
Disclosed is a device that is configured to be implanted adjacent interspinous processes of a patient. In one aspect, a spinal implant device comprises: a spacer region adapted to be positioned between first and second spinous processes of first and second vertebral bodies to limit movement of the first spinous process and the second spinous process toward one another; and an attachment region attached to the spacer region, the attachment region adapted to attach to the first spinous process via a fastener, the attachment region comprising a pair of pads having attachment elements that are configured to attach onto the spinous process
Claims7
A spinal implant device, comprising:
- a first post adapted to be positioned between first and second spinous processes of first and second vertebral bodies to limit movement of the first spinous process and the second spinous process toward one another, wherein the first post is a male member;
- a second post that mates with the first post, wherein the second post is a female member;
- a ratchet interface that movably attaches the first post to the second post, wherein the ratchet interface permits the first and second posts to be pushed toward one another in an interlocking fashion such that the first and secons posts can be successively moved toward one another and locked in successively closer positions;
- and
- a first pad attached to an end of the first post, the first pad including a set of spikes adapted to engage a spinous process;
- a second pad attached to an end of the second post, the second pad including a set of spikes adapted to engage a spinous process
Dependencies are inferred from the claim text.