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US 2013/0158189 A1Published application
Method for Polymer Plasma Deposition
OwnerFrancois Reniers, Julie Hubertinventors
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Abstract
The present invention is related to a method or the deposition of a chlorinated polymeric layer onto a ubstrate, said method comprising the steps of:—generating a plasma in a gaseous medium by means of a plasma device;—placing the substrate in contact with the plasma, or in the post-plasma area;—introducing in said plasma or in the post-plasma area a chlorinated precursor of the chlorinated polymer.
Claims15
Method for the deposition on a substrate of a chlorinated polymeric layer, said method comprising the steps of:
- generating a plasma in a gaseous medium by means of a plasma device comprising optionally a post-plasma area said plasma device being maintained at a pressure comprised between 100 hPa and 2000 hPa;
- placing the substrate in contact with the plasma, or in the post-plasma area;
- introducing in said plasma or in the post-plasma area a precursor of the chlorinated polymer, said precursor comprising a chlorinated organic compound,
- characterised in that the oxygen partial pressure in the plasma device is maintained below 10 hPa, preferably below 5 hPa.
1 more element
Dependencies are inferred from the claim text.