Multiple-Patterning Overlay Decoupling Method

A method comprising:

• forming a first layer including a first structure on a substrate;
• obtaining first layer alignment data from an alignment mark;
• determining first placement information data from the first layer alignment data;
• forming a second layer including a second structure over the first layer;
• obtaining second layer alignment data from the alignment mark;
• determining second placement information data from the second layer alignment data;
• forming a third layer including a third structure over the second layer, the third structure including a first substructure and a second substructure,
• wherein forming the third structure includes using the first placement information data to independently align the first substructure to the first structure and using the second placement information data to independently align the second substructure to the second structure.

A method comprising:

• forming a first structure in a first layer of a substrate, wherein forming the first structure includes a first exposure process that forms a first pattern that defines the first structure;
• forming a second structure in a second layer of a substrate, wherein the second layer overlays the first layer, wherein forming the second structure includes a second exposure process that forms a second pattern that defines the second structure;
• forming an nth structure including a first and second substructure in an nth layer of the substrate, wherein the nth layer overlays the first and second layers, wherein forming the nth structure includes an nth exposure process that forms an nth pattern that defines the nth structure,
• wherein forming the nth structure includes using first alignment data to independently align the first substructure to the first structure and using second alignment data to independently align the second substructure to the second structure.