Multi charged particle beam writing apparatus and multi charged particle beam writing method

A multi charged particle beam writing method comprising:

• detecting a defective beam in multiple beams having passed through a plurality of openings of an aperture member in which the plurality of openings are formed for forming the multiple beams by irradiation of a charged particle beam;
• setting a region such that more openings in remaining openings except for an opening through which the defective beam passes in the plurality of openings of the aperture member are included in the region;
• selecting a mode from a first mode in which a pattern is written on a target object by using multiple beams that have passed openings in the region and a second mode in which multiple writing is performed while shifting a position by using at least one of remaining multiple beams in a state where the defective beam is controlled to be beam off and additional writing is performed for a position which was supposed to be written by the defective beam;
• and
• writing a pattern on a target object in the mode selected.

A multi charged particle beam writing apparatus comprising:

• a stage configured to mount a target object thereon and be capable of moving continuously;
• an emission unit configured to emit a charged particle beam;
• an aperture member in which a plurality of openings are formed, configured to form multiple beams by letting a region including a whole of the plurality of openings be irradiated by the charged particle beam and letting parts of the charged particle beam pass through a corresponding opening of the plurality of openings respectively;
• a plurality of blankers configured to respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member;
• a blanking aperture member configured to block each of beams which were deflected to be in a beam off state by the plurality of blankers;
• a detection unit configured to detect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member;
• and
• a writing processing control unit configured to control writing processing such that multiple writing is performed while shifting a position by using at least one of remaining multiple beams in a state where the defective beam is controlled to be beam off and additional writing is performed for a position which was supposed to be written by the defective beam.