Adjustable nozzle for plasma deposition and a method of controlling the adjustable nozzle
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsWei-Ching WU, Wen-Long LEE, Ding-I LIU
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Abstract
The description relates to an adjustable nozzle capable of pivoting about an axis of the nozzle and translating along the axis of the nozzle. A high density plasma chemical vapor deposition (HDP CVD) chamber houses a plurality of adjustable nozzles. A feedback control system includes a control unit coupled to the adjustable nozzle and the HDP CVD chamber to form a more uniform thickness profile of films deposited on a wafer in the HDP CVD chamber.
Claims20
A high density plasma chemical vapor deposition (HDP CVD) chamber comprising:
- a plurality of adjustable nozzles, wherein an adjustable nozzle comprises
- a base having a hollow center portion for conducting gas, the base configured for connection to a gas source;
- and
- a tip coupled to the base and having an opening formed therein for conducting gas from the base to the exterior of the nozzle, wherein
- the base is configured for pivoting about a longitudinal axis of the base and/or for translation along the longitudinal axis of the base in response to a control signal generated by a control unit.
A method of controlling a position of an adjustable nozzle comprising:
- depositing a film on a surface of a wafer using a high density plasma chemical vapor deposition (HDP CVD) chamber;
- measuring a thickness profile of the surface of the wafer;
- comparing the measurement of the thickness profile of the surface of the wafer with a reference value using a control unit;
- and
- transmitting a control signal to the adjustable nozzle to alter the position of the adjustable nozzle based on the result of the comparison, wherein
- the adjustable nozzle comprises:
- a base having a hollow center portion for conducting gas, the base configured for connection to a gas source;
- and
- a tip coupled to the base and having an opening formed therein for conducting gas from the base to the exterior of the nozzle, wherein
- the base is configured for pivoting about a longitudinal axis of the base and/or for
- translating along the longitudinal axis of the base in response to the control signal.
A feedback control system for a high density plasma chemical vapor deposition (HDP CVD) chamber controlling a position of an adjustable nozzle comprising:
- a plurality of adjustable nozzles housed in the HDP CVD chamber;
- a control unit for generating a control signal, wherein
- an adjustable nozzle comprising:
- a base having a hollow center portion for conducting gas, the base configured for connection to a gas source;
- and
- a tip coupled to the base and having an opening formed therein for conducting gas from the base to the exterior of the nozzle, wherein
- the base is configured for pivoting about a longitudinal axis of the base and/or for translating along the longitudinal axis of the base in response to a control signal generated by a control unit.
Dependencies are inferred from the claim text.