Sputter gun having variable magnetic strength
AssigneeIntermolecular, Inc.
InventorsOwen Ho Yin Fong, Kent Riley Child
Life of this patent
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AssigneeIntermolecular, Inc.
InventorsOwen Ho Yin Fong, Kent Riley Child
Estimating the term…
A sputter source is provided. The sputter source includes a shaft extending through a central region of the sputter source. A first end of the shaft is coupled to a drive and a second end of the shaft is coupled to a bottom plate. A first plate having a ramped surface is included where the first plate is stationary. A second plate having a ramped surface is provided where the second plate is disposed above the first plate such that portions of the ramped surfaces contact each other. The second plate is coupled to the shaft, wherein the second plate is operable to rotate and move axially as the shaft rotates in a first direction and wherein the second plate is operable to remain stationary as the shaft rotates in a second direction.
A sputter source, comprising:
A sputter source, comprising:
A method of processing a substrate, comprising;
Dependencies are inferred from the claim text.