Dielectric thin film-forming composition, method of forming dielectric thin film and dielectric thin film formed by the method

A dielectric thin film-forming composition for forming a BST dielectric thin film, comprising:

• a liquid composition for forming a thin film in the form of a mixed composite metal oxide in which a composite oxide B containing copper (Cu) and a composite oxide C containing manganese (Mn) are mixed into a composite metal oxide A represented with the general formula:
• Ba1-xSrxTiyO3 (wherein, 0.2<x<0.6 and 0.9<y’1.1);
• wherein,
• the liquid composition is composed of an organic metal compound solution in which the raw material for composing the composite metal oxide A, the raw material for composing the composite oxide B and the raw material for composing the composite oxide C are dissolved in an organic solvent at a ratio so as to yield the metal atomic ratio indicated in the aforementioned general formula, and so that the molar ratio B/A of the composite oxide B to the composite metal oxide A is within the range of 0.002<B/A<0.05, and the molar ratio C/A of the composite oxide C to the composite metal oxide A is within the range of 0.002<C/A<0.03.