Extended and independent rf powered cathode substrate for extreme edge tunability
AssigneeApplied Materials, Inc.
InventorsVALENTIN TODOROW, SAMER BANNA, IMAD YOUSIF, ALBERT WANG, GARY LERAY
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorsVALENTIN TODOROW, SAMER BANNA, IMAD YOUSIF, ALBERT WANG, GARY LERAY
Estimating the term…
Apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate may include a substrate support comprising a first electrode disposed within the substrate support and having a peripheral edge and a first surface; a substrate support surface disposed above the first surface of the first electrode; and a second electrode disposed within the substrate support and extending radially beyond the peripheral edge of the first electrode, wherein the second electrode has a second surface disposed about and above the first surface of the first electrode.
A substrate support, comprising:
A substrate support, comprising:
A substrate support, comprising:
Dependencies are inferred from the claim text.