Projection aligner

A projection exposure method radiating a luminous flux including ultraviolet rays onto a photomask, blocking the luminous flux having passed through said photomask at the peripheral portion of said substrate applied with photoresist by light blocking means covering the peripheral portion of said substrate so that the peripheral portion of said substrate applied with photoresist being not irradiated with said luminous flux but the central portion where the center side from the peripheral portion being radiated;

• said projection exposure method comprising:
• a step of mounting said substrate on a substrate stage by a substrate convey means;
• a step of arranging said light blocking means above and closer to said substrate;
• a step of calculating a position of said substrate mounted on said substrate stage and a position of said light blocking means;
• and
• a step of in a case of the position of said light blocking means respect to the position of said substrate displaced out of the range of the predetermined range, moving said light blocking means so that the displacement is within the predetermined range.