Liquid crystal display device and method for fabricating the same

A method of fabricating a liquid crystal display device, the method comprising:

• forming a metal film on a substrate;
• forming a gate electrode, a gate line and a first common line using a first masking procedure;
• forming a gate insulation film on the substrate formed with the gate electrode;
• forming a channel layer, a source electrode, a drain electrode and a data line on the substrate using a second masking procedure;
• forming a protective film on the substrate provided formed with the source and drain electrodes;
• forming a contact hole in the protective film using to a third masking procedure to expose a part of the drain electrode;
• forming a transparent conductive material layer and an opaque metal layer on the substrate formed with the protective film;
• and
• performing an etch process according to a fourth masking procedure on the opaque metal layer and the transparent conductive material layer to form pixel electrodes and common electrodes having a stacked layer structure,
• wherein the stacked layer structure are configured to set light transmittance of zones corresponding to the pixel electrodes and the common electrodes at or below a value to prevent forming of a defect in the liquid crystal display device during a photolithography process.