Process kit components for use with an extended and independent rf powered cathode substrate for extreme edge tunability

A process kit ring for use with a substrate support of a process chamber, comprising:

• a ring shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 15.115 inches to about 15.125 inches and wherein the inner edge has a diameter of about 11.752 inches to about 11.757 inches, and wherein the ring shaped body has a thickness of about 0.510 inches to about 0.520 inches;
• a first step and a second step formed in the ring shaped body between the outer edge and inner edge, wherein the first step has an outer diameter of about 12.077 inches to about 12.087 inches, and wherein the second step has an outer diameter of about 11.884 inches to about 11.889 inches;
• and
• a ring extending downward from the bottom of the ring shaped body proximate the outer edge of the ring shaped body, the ring having an inner diameter of about 14.905 inches to about 14.915 inches.