Micro-electro-mechanical structure (mems) capacitor devices, capacitor trimming thereof and design structures
AssigneeInternational Business Machines Corporation
InventorsChristopher V. JAHNES, Anthony K. STAMPER
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Abstract
Micro-electro-mechanical structure (MEMS) capacitor devices, capacitor trimming for MEMS capacitor devices, and design structures are disclosed. The method includes identifying a process variation related to a formation of micro-electro-mechanical structure (MEMS) capacitor devices across a substrate. The method further includes providing design offsets or process offsets in electrode areas of the MEMS capacitor devices across the substrate, based on the identified process variation.
Claims23
A method comprising:
- identifying a process variation related to a formation of micro-electro-mechanical structure (MEMS) capacitor devices across a substrate;
- and
- providing design offsets or process offsets in electrode areas of the MEMS capacitor devices across the substrate, based on the identified process variation.
A method, comprising:
- identifying a first amount of systematic capacitance variation from a target capacitance value for a plurality of first capacitors on a substrate;
- and
- modifying a feature of at least some of the first capacitors to adjust a capacitance value at different locations on the substrate.
A structure comprising:
- a first set of micro-electro-mechanical structure (MEMS) capacitor devices having a first adjusted capacitance value based on identified process variations at a first location on a substrate;
- and
- a second set of a MEMS capacitor devices having a second adjusted capacitance value based on identified process variations at a second location on the substrate, wherein
- the first adjusted capacitance value and the second adjusted capacitance value are different as a result of a physical characteristic feature of the first and second sets of MEMS capacitor devices.
A method in a computer-aided design system for generating a functional design model of a plurality of MEMS capacitor devices, the method comprising:
- generating a functional representation of a first set of micro-electro-mechanical structure (MEMS) capacitor devices having a first adjusted capacitance value based on process variations at a first location on a substrate;
- and
- generating a functional representation of a second set of a MEMS capacitor devices having a second adjusted capacitance value based on process variations at a second location on the substrate, wherein
- the first adjusted capacitance value and the second adjusted capacitance value are different as a result of a physical characteristic feature of the first and second sets of MEMS capacitor devices.
Dependencies are inferred from the claim text.