Photonic Systems and Methods of Forming Photonic Systems
AssigneeMicron Technology, Inc.
InventorRoy E. Meade
Life of this patent
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Abstract
Some embodiments include photonic systems. The systems may include a silicon-containing waveguide configured to direct light along a path, and a detector proximate the silicon-containing waveguide. The detector may comprise a detector material which has a lower region and an upper region, with the lower region having a higher concentration of defects than the upper region. The detector material may comprise germanium in some embodiments. Some embodiments include methods of forming photonic systems.
Claims12
1-26. (canceled)
A photonic system, comprising:
- a silicon-containing waveguide over a base;
- an opening extending into the base;
- a liner narrowing the opening;
- germanium-containing detector material over the base and extending into the narrowed opening;
- the detector material being part of a detector configured to detect light within the waveguide;
- a lower region of the germanium-containing detector material within the narrowed opening having a higher concentration of defects than an upper region of the germanium-containing detector material above the narrowed opening;
- and
- wherein the upper region extends laterally outwardly beyond the liner so that some of the upper region is directly over the liner.
A photonic system, comprising:
- a silicon-containing waveguide over a monocrystalline silicon base;
- an opening extending into the base;
- a liner narrowing the opening;
- a germanium-containing detector material over the base and extending into the narrowed opening;
- the detector material being part of a detector configured to detect light within the waveguide;
- a region of the germanium-containing detector material within the narrowed opening having a higher concentration of defects than a region of the germanium-containing detector material outside of the narrowed opening;
- wherein the silicon-containing waveguide is comprised by a line spaced from the monocrystalline silicon base by one or more materials;
- wherein the liner comprises a liner material;
- and
- wherein the liner material is along sidewalls of the silicon-containing waveguide line.
A method of forming a photonic system, comprising:
- forming an opening into a monocrystalline material;
- lining sidewalls of the opening with liner material, while leaving monocrystalline material exposed along a bottom of the lined opening;
- epitaxially growing a detector material from the exposed monocrystalline material along the bottom of the lined opening;
- the detector material having a lower region within the lined opening and having an upper region over the lower region;
- the lower region having a higher concentration of defects than the upper region;
- the upper region extending laterally outward of the lower region and being across the liner material;
- and
- forming a silicon-containing waveguide over the base and within range of a detector comprising the detector material such that the detector can be utilized to ascertain presence of light within the waveguide.
Dependencies are inferred from the claim text.