N-doped single crystal diamond substrates and methods therefor
AssigneeBoard of Trustees of Michigan State University
InventorsTimothy A. Grotjohn, Jes Asmussen, Timothy Hogan
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AssigneeBoard of Trustees of Michigan State University
InventorsTimothy A. Grotjohn, Jes Asmussen, Timothy Hogan
Estimating the term…
The disclosure relates to the formation of n-doped single crystal diamond (SCD). In general, a SCD substrate is preferentially anisotropically etched to provide one or more recesses in the SCD substrate, where the recesses are defined by (1 1 1) surface sidewalls resulting from the preferential anisotropic etching process. The recesses generally have a pyramidal shape. N-type doped SCD (e.g., using a phosphorous dopant) is then deposited into the preferentially anisotropically etched recesses. When the SCD substrate is a p-type diamond (e.g., using a boron dopant), the resulting structure can be used as a p-n junction, for example for use in various power electronic apparatus such as diodes, etc.
A method for forming an n-doped single crystal diamond (SCD) structure, the method comprising:
An n-doped single crystal diamond (SCD) structure comprising:
An n-doped single crystal diamond (SCD) structure comprising:
Dependencies are inferred from the claim text.