US 2013/0153536 A1 · COMBINATORIAL PROCESSING USING A REMOTE PLASMA SOURCE

Abstract

Methods and apparatuses for combinatorial processing using a remote plasma source are disclosed. The apparatus includes a remote plasma source and an inner chamber enclosing a substrate support. An aperture is operable to provide plasma exposure to a site-isolated region on a substrate. A transport system moves the substrate support and is capable of positioning the substrate such that the site-isolated region can be located anywhere on the substrate. Barriers and a gas purge system operate to provide site-isolation. Plasma exposure parameters can be varied in a combinatorial manner. Such parameters include source gases for the plasma generator, plasma filtering parameters, exposure time, gas flow rate, frequency, plasma generator power, plasma generation method, chamber pressure, substrate temperature, distance between plasma source and substrate, substrate bias voltage, or combinations thereof.

Claims18

Dependent claims

An apparatus for remote plasma exposure of a substrate comprising

a first chamber;
a remote plasma source;
a second chamber enclosing a substrate support, wherein the second chamber comprises a top surface parallel to the surface of the substrate support, a bottom surface parallel to the top surface and disposed below the substrate support, and one or more side walls;
an aperture disposed in the top surface of the second chamber and operable to provide site-isolated exposure of plasma from the remote plasma source to a site-isolated region on a substrate, wherein the aperture is disposed between the remote plasma source and the substrate and has an area less than that of the substrate;
and
a transport system comprising the substrate support and capable of positioning the substrate such that the site-isolated region can be located anywhere on the substrate;
wherein the remote plasma source, second chamber and the transport system are disposed within the first chamber.

4 more elements

Dependencies are inferred from the claim text.

Combinatorial processing using a remote plasma source

Life of this patent

Combinatorial processing using a remote plasma source

Life of this patent

Abstract

Claims18