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US 2013/0153534 A1Published application
Fabrication of seamless large area master templates for imprint lithography using step and repeat tools
AssigneeMolecular Imprints, Inc.
InventorsDouglas J. Resnick, Michael N. Miller, Frank Y. Xu
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Abstract
Described are methods of forming large area templates useful for patterning large area optical devices including e.g. wire grid polarizers (WGPs). Such methods provide for seamless patterning of such large area devices.
Claims17
A method of forming a large area template comprising:
- providing a substrate;
- forming a patterned layer on the substrate or the oxide layer by printing a plurality of patterned fields on the substrate, wherein any disruption between adjacent field patterns is less than 10 microns;
- transferring the pattern into the substrate and removing any remaining patterned layer to form a patterned feature area on the substrate.
Dependencies are inferred from the claim text.